Nano-localization of Photochemical Polishing Processes of the Dielectrics Surface Via an Optical Near Field

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Published: Dec 22, 2017
Keywords:
Optical near field Evanescent wave Dipole-dipole interaction Sub-nano-polishing

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D. Vasylenko
Faculty of Radio Physics, Electronics and Computer Systems, Taras Shevchenko National University of Kyiv, Kyiv 03127, Ukraine
P. Kravchuk
Faculty of Radio Physics, Electronics and Computer Systems, Taras Shevchenko National University of Kyiv, Kyiv 03127, Ukraine
V. Sydorenko
Faculty of Radio Physics, Electronics and Computer Systems, Taras Shevchenko National University of Kyiv, Kyiv 03127, Ukraine
V. Grygoruk
Faculty of Radio Physics, Electronics and Computer Systems, Taras Shevchenko National University of Kyiv, Kyiv 03127, Ukraine
V. Kanevskii
Chuiko Institute of Surface Chemistry, National Academy of Sciences of Ukraine, Kyiv 03164, Ukraine

Abstract

The method of polishing a surface of a quartz substrate with a nanometer scale of roughness was investigated, using the phenomenon of optical dipole-dipole interaction of atomic chlorine with quartz. Atomic chlorine is obtained by photodissociation of molecular chlorine via an optical near field of nanoinhomogeneities of a quartz substrate. The formation of the evanescent wave on the substrate surface occurs when the substrate is irradiated at an angle of total internal reflection directed to the lower surface of the substrate. The evanescent wave polarizes the atoms of the chlorine and quartz particles, and directs them to the most effective way for photochemical sub-nano-polishing.

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How to Cite
1.
Vasylenko D, Kravchuk P, Sydorenko V, Grygoruk V, Kanevskii V. Nano-localization of Photochemical Polishing Processes of the Dielectrics Surface Via an Optical Near Field. Thai J. Nanosci. Nanotechnol. [Internet]. 2017 Dec. 22 [cited 2024 Dec. 27];2(2):1-6. Available from: https://ph05.tci-thaijo.org/index.php/TJNN/article/view/43
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Vol. 2 No. 2 (2017): TJNN
Section
Research Articles
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